Telic combines substrate preparation, thin film deposition, photoresist coating, lithography, and lift-off processing to create custom patterned structures for semiconductor, photonic, microfluidic, and advanced research applications.
By integrating these capabilities within a single facility, Telic supports projects from prototype development through production while reducing handling and streamlining manufacturing workflows.
Capabilities
- Direct Write Photomasks
- Write Area up to 200 mm × 200 mm
- Minimum Feature Size of 1 µm
- Mask Sizes from 2.5″ × 2.5″ to 7″ × 7″
- Low Reflective Chrome
- Iron Oxide
- Soda Lime or Quartz Substrates
These capabilities support both development programs and ongoing production requirements across a wide range of industries.
Direct-Write Photomasks
Telic’s direct-write photomask capability supports rapid pattern generation for custom photomasks, reticles, aperture windows, and development programs.
Lithography Services
Telic provides lithographic patterning solutions for the creation of custom device structures and patterned substrates. Services Include:
- Mask Alignment
- Multilayer Lithography
- Aperture Windows
- Target Reticles
- Custom Pattern Generation
These capabilities support both development programs and ongoing production requirements across a wide range of industries.
Lift-Off Processing
Lift-off processing enables the creation of patterned thin-film structures through photoresist-defined deposition processes.
When combined with Telic’s sputtering and spin coating capabilities, lift-off processing supports the fabrication of custom metallic and functional thin-film patterns used in photonic, sensing, and microfabrication applications.
Integrated Manufacturing Workflow – Unlike facilities that provide only a single process step, Telic combines multiple critical manufacturing capabilities under one roof:
Double-Sided Polishing PVD Thin Film Coatings Spin Coating Lithography & Lift-Off Quality Inspection Custom Cleanroom Packaging
This integrated approach helps reduce handling, improve process continuity, and accelerate the transition from development to production.
Lithography & Lift-Off Applications
- Photomasks
- Reticles
- Photonic Devices
Custom thin-film structures supporting advanced optical applications - Research & Development
Rapid prototyping and specialized microfabrication support
Let’s Discuss Your Project
Whether you require non-standard substrate materials, custom thicknesses, specialized chrome coatings, large-format photomask blanks, or integrated lithography support, Telic’s engineering team can develop a solution tailored to your application.
