PVD Thin Film Coatings

Telic provides Physical Vapor Deposition (PVD) thin film coatings using cylindrical and planar magnetron sputtering systems. Our coating platforms support metals, oxides, transparent conductive films, and multilayer thin film structures for microfabrication, lithography, photonics, and advanced research applications.

By integrating substrate preparation, sputtering, spin coating, lithography, inspection, and packaging under one roof, Telic provides a streamlined manufacturing solution from bare substrate through finished device fabrication.

Ultra-Smooth ITO Coatings Produced by Pulsed DC Sputtering

Telic has worked closely with ITO users to develop an ultra-smooth ITO coating with very low defect densities.  This coating is produced in our custom load lock multi target inline sputtering system featuring pulsed DC power supplies, high uniformity magnetron cathodes and precision reactive gas control system.  All coating processes are monitored within situ residual gas analyzer.

When coupled with our double side polished substrates and our photoresist coatings users can achieve sub-micron geometries.  ITO coatings can also be supplied in a multi coating stack, including ITO/Cr/Au.

• Coatings are available with resistivities ranging from 15 – 2000 ohms/sq
• Sizes available from 1”x3” to 12”x12”
• Film thickness range from 30 Å to 5 µm

Magnetron Sputtering Capabilities

Telic operates multiple sputtering platforms designed to support both development and production requirements.

Multilayer Thin Film Structures

Telic specializes in multilayer sputtered films used in advanced lithography and microfabrication applications. Typical structures may incorporate metallic, dielectric, and transparent conductive layers to achieve application-specific electrical, optical, or process requirements.