Telic manufactures large-format photoresist-coated substrates designed for the fabrication of 3D microstructures, microfluidic devices, MEMS components, optical structures, and advanced research applications.

Combining precision substrate preparation, thin film processing, and photoresist coating within a controlled cleanroom environment, Telic provides ready-to-process substrates that support both prototype development and production-scale manufacturing.

Photoresist Coating Services

Telic provides spin-coated photoresist processing on a wide variety of substrate materials and sizes.

Capabilities

  • Positive Photoresists
  • Negative Photoresists
  • Thick Photoresist Coatings
  • BARC Coatings
  • Custom Coating Processes
  • Prototype and Production Quantities

Available Substrate Materials

  • Soda Lime Glass
  • Borosilicate Glass
  • Quartz
  • Silicon Wafers
  • Customer-Supplied Materials

Large Format Capability

Unlike conventional wafer-based processing, Telic supports photoresist-coated substrates ranging from standard lithography formats to panels as large as 50″ × 50″.

Large-area substrates enable the fabrication of oversized devices, high-density production layouts, and specialized research structures that exceed the limitations of traditional semiconductor processing platforms.

Integrated Manufacturing

Because Telic performs substrate preparation, polishing, thin film deposition, photoresist coating, lithography, and packaging within a single facility, customers can source multiple manufacturing steps from a single supplier.

This integrated approach helps simplify project management while reducing handling and processing delays.

Large Photoresist Blank Applications

  • 3D Microstructures
  • Microfluidic Devices
  • MEMS Development
  • Optical Structures
  • Research & Development

Let’s Discuss Your Project

Whether you’re developing a prototype, scaling production, or looking for a manufacturing partner for a specialized microfabrication challenge, our team is ready to help.