Photomask Blanks
Precision Photomask Substrates for Optical & Microfabrication Applications
For more than five decades, Telic has supplied high-quality photomask blanks to the semiconductor, microfabrication, photonics, flat panel display, and research communities. Manufactured in a controlled cleanroom environment, Telic photomask blanks provide the substrate quality, film performance, and consistency required for demanding lithography applications.
Available in standard and large-format sizes, Telic photomask blanks are produced using precision polished glass substrates and vacuum-deposited sputtered chrome coatings to support applications ranging from prototype development to production manufacturing.
Standard to Large Format
From 2-inch photomask blanks through 50-inch large-area substrates, Telic supports both conventional and specialized lithography applications.
Film Specifications
Telic photomask blanks utilize vacuum-deposited DC sputtered chrome films produced in a class 100 controlled cleanroom environment.
- Chrome Thickness: 1100 Å ±10%
- Optical Density: 2.8 ±0.2 @ 530 nm
- Custom thicknesses available up to 5 µm
- Low Reflective Chrome (LRC) available
Substrate Quality
All photomask substrates are polished on both sides and inspected for surface quality and glass defects.
Standard Specifications
- Thickness: 0.50 mm to 6 mm
- Defect Inspection: Free of glass defects >2 µm
- Flatness: ≤15 µm
- Custom thicknesses available upon request
Standard Photomask Blanks
Designed for conventional optical lithography applications requiring high-quality substrates and chrome coatings.
Available Substrates
- Soda Lime
- Borosilicate Glass
- White Crown Glass
- Quartz (Synthetic Fused Silica)
Available Sizes
- 2″ × 2″
- 3″ × 3″
- 4″ × 4″
- 5″ × 5″
- 6″ × 6″
- 7″ × 7″
Large Format Photomask Blanks
For flat panel display, large-area microfabrication, holography, and advanced manufacturing applications.
Available Substrates
- Soda Lime
- Borosilicate Glass
- Quartz
Available Sizes
- 9″ × 9″
- Through 50″ × 50″
E-Beam Photomask Blanks
Photomask blanks optimized for electron beam lithography and advanced pattern generation processes.
Available Substrates
- Soda Lime
- Borosilicate Glass
- Quartz
Available Sizes
- 2″ × 2″
- 3″ × 3″
- 4″ × 4″
- 5″ × 5″
- 6″ × 6″
- 7″ × 7″
Photomask Blank Applications
- Semiconductor Development
- Microelectronics R&D
- MEMS Devices
- Flat Panel Displays
- PCB Tooling Masters
- Photonic Devices
- Holographic Mastering
- Microfluidic Devices
- Research & University Programs
- Master & Production Reticles
Need Something Custom?
Whether you require non-standard substrate materials, custom thicknesses, specialized chrome coatings, large-format photomask blanks, or integrated lithography support, Telic’s engineering team can develop a solution tailored to your application.
