Photomasks
Precision Photomasks for Microfabrication, MEMS & Semiconductor Applications
We Manufacture the Highest-Quality Laser Patterned Photomasks at the Best Value
A photomask is an image-transferring tool. The photomask is comprised of a solid, transparent substrate, such as glass or fused silica, which has an opaque coating on one surface into which a microscopic pattern has been etched, leaving some regions transparent and others opaque. The opaque regions prevent mask light from passing through, while the transparent regions allow light to pass through.
The photomask is placed in proximity to another substrate, such as a silicon wafer, which has been coated with a photosensitive material called photo resist. The light travels through the photomask, exposing certain regions of the photo resist on the adjoining substrate while the opaque regions protect the photo resist from being exposed.
Telic manufactures high-quality photomasks for commercial, defense, biomedical, research, and university applications. Produced using precision lithography, photomask-quality substrates, and rigorous inspection processes, our photomasks provide the accuracy and repeatability required for today’s advanced microfabrication and photolithography applications.
Whether supporting rapid prototype development or production manufacturing, our engineering team works closely with customers to recommend the appropriate photomask solution based on substrate material, resolution requirements, feature size, and application.
Photomask Capabilities
- Binary Chrome Photomasks
- Direct-Write Photomasks
- High-Resolution Microfabrication Masks
- Prototype & Production Quantities
- Commercial, Defense, Biomedical, & Research Applications
- Engineering Support for Custom Mask Development
- Rapid Turnaround for Standard Mask Formats
Available Substrate Materials
Telic manufactures photomasks using premium optical substrates selected for the intended exposure wavelength and application.
Soda Lime Glass
- Cost-effective solution for visible wavelength lithography
- Excellent choice for standard commercial applications
Quartz (Fused Silica)
- Superior UV transmission
- Low thermal expansion
- Ideal for demanding lithography and precision alignment applications
Integrated Manufacturing
Unlike suppliers that provide only finished photomasks, Telic offers an integrated microfabrication workflow that combines photomask blank manufacturing, precision thin film deposition, spin coating, lithography, inspection, and cleanroom packaging. This vertically integrated approach provides customers with a single manufacturing partner from substrate preparation through finished microfabrication components.
Photomask Applications
- Semiconductor Device Fabrication
- MEMS Manufacturing
- Microelectronics
- Printed Circuit Board Tooling
- Biomedical Devices
- Microfluidic Devices
- Optical Components
- Research & University Laboratories
- Sensor Development
- Photonics
Need Something Custom?
Whether you require non-standard substrate materials, custom thicknesses, specialized chrome coatings, large-format photomask blanks, or integrated lithography support, Telic’s engineering team can develop a solution tailored to your application.
