TELIC COMPANY

SUBSTRATES

• Quartz (Synthetic Fused Silica) 

APPLICATIONS

- Laser Ablation Masks

SUBSTRATES SPECIFICATIONS

SIZE: Squares: 2" through 7"

THICKNESS:  0.090" - 0.250" (non standard thickness upon request)

SURFACE: All plates polished on both sides & inspected to be free of glass defects > 5 micron

FLATNESS:

        Master Grade: < 5 µ m

        Master Grade: < 2 µ m

FILM SPECIFICATION

ALUMINUM:  Vacuum Deposited, DC Sputtered in Class 100 Environment

THICKNESS/OPTICAL DENSITY: Standard: 1200Å /O.D.=3.0 ± 0.3 @ 430nm.

                                                        Custom Thicknesses up to 5  µ m

REFLECTIVITY: >85%

PHOTORESIST: 

5300Å AZ 1500 filtered to 0.045 microns at point of use.  Fringless and Regular Spin Available. 

Custom Photoresist options include all widely used positive and negative optical and E-beam resist available.

Including: AZ MIR701, AZ P4600, AZ 5206, AZ 9260, AZ nLOF 2000, AZ 6615, AZ ECI3027

S1800, HR200, IP3500, IP3600, PMMA, AR N7700, SU-8, LOR A, LOR B, PMGI

Aluminum Blank Information Sheet (PDF)

Please Contact Us for more information.