TELIC COMPANY

E Beam Photomask Blanks


SUBSTRATES 

  • Soda Lime
  • Borosilicate (Eagle, D263, AF32, Borofloat)
  • White Crown (B-270, BK-7)
  • Quartz (Synthetic Fused Silica)

APPLICATIONS:

- Reticles, Master Grade

SUBSTRATE SPECIFICATIONS

SIZE: thickness Squares 2" through 7"

THICKNESS: 0.010" - 0.220" (0.50mm - 6mm) non standard thickness is available upon request

SURFACE:  All plates are polished on both sides and inspected to be free of glass defects > 2 microns

FLATNESS:   ≤15 microns

FILM SPECIFICATIONS

CHROME:  Vacuum Deposited, DC Sputtered in Class 100 Environment

THICKNESS/OPTICAL DENSITY: Standard: 1100Å ± 10% / O.D. = 2.8 ± 0.2 @ 530mm.

                                                        Custom Thicknesses up to 5  µm

REFLECTIVITY: 

 

Low Reflective - LRC

8% @ 450nm
Mid Reflective - MRC 33% @ 450nm
High Reflective - HRC >48% @ 450nm
Blue - R632 <5% @ 632nm
Blue/Chrome/Blue - R632/632 <5% @ 632nm Both Sides
Green - R850 <5% @ 850nm
Green/Chrome/Green - R850/850 <5% @ 850nm Both Sides

 

CLICK HERE for Chrome Reflectivity Graph

 

PROCESS:

Etchable in all conventional Wet Etch systems

Plasma Grade recommended for Dry Etch systems

PHOTORESIST:

 PMMA, AR N7700 Negative, SU-8

 


Telic Company - 28478 Westinghouse Place - Valencia, California 91355 - P: 661.702.8603 - F: 661.257.6802 - E: sales@TelicCompany.com